|
General features
- Rich Windows compliant user experience
- UI taylored for ease of learning and use
- Rich visual graphics
- 3d device representation
- Mask creation
- Process flow and process modeling
- Full device analysis and behavior extraction
- Thin film material database
- Material properties as function of processing parameters
- Anisotropic etch simulator
- Physics simulators for coupled simulations in the following domains: mechanics, electrostatic, electromagnetic, fluidic, piezoresistive,thermal.
- Import/Export filters to various industry standard data formats
General Analysis Features
- Linear and non-linear analysis
- Static, steady state, and transient analysis
- Fully 3D coupled dynamics analysis
- Parametric variation of parameters
- Takes into account fabrication process-induced effects
- Submodeling, symmetry, and other size reducing techniques
- Animation and color mapping of results
- Export and import to/from other engineering CAD tools
Electrostatic, ThermoMechanical, and fully 3D coupled ThermoElectroMechanical
- Displacement due to voltage and thermal loading
- Capacitance due to voltage and thermal deformation
- Pull-in voltage, contact and hysteresis loop calculations
- Full multi-dielectric capabilities
- Stress, temperature, potential, charge, and pressure distribution
- Joule/resistive heating actuation
- Assembly and latching analysis
- Post-assembly coupled analysis
- Natural frequency and mode shapes as a function of loading
- Heat transfer: radiation, conduction, and convection
|
Piezoelectric and Piezoresistive
|
Anisotropic etch simulation
- Simulate <100> or <110> wafer orientation etching
- Simulate etching under different time, temperature, and concentration parameters
- Access TMAH and KOH etch-rate databases, or use customized etch-rate data
- Etch the top, bottom, or both sides of a wafer
- Implement multiple protective etch stops
- Perform multiple etchings with different masks on a single wafer
- Study the effects of misalignments and other process deviations
- Determine the effects of vertical etching coupled with anisotropic etching
- Perform 3D geometric visualization and cross-sectioning
- Take distance measurements on the etched wafer
- Visualize and export 3D results in DXF and VRML formats
Additional features
- Residual pre-stressing due to fabrication
- Multiple dielectric layers
- Squeezed film liquid and air damping
- Fully 3D dynamic analysis
- Electrostatic charge distribution
- Linear and non-linear models
- Behavioral model output
- True contact analysis
- Multiple dielectric layers
- Snap-down voltage
- Switching time
- Hysteresis
- Frequency shift vs. voltage bias
- Electrostatic charge distribution
- High frequency EM simulation
- Packaging delay
- Cross-talk
- S-Parameter extraction
- Fully 3D dynamic analysis
- Linear and non-linear models
- Device behavioral model output
- Electrostatic pressure distribution
- Electrostatic charge distribution
- Capacitance matrix results
- Joule Heating
- Hysteresis
- AC voltage loading
|