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IntelliSuite: more features than you can shake your stick at






Henry David Thoreau once wrote, "Simplify. Simplify. Simplify." Thoreau would be pleased that we took his dictum to heart. Our mission in developing IntelliSuite is to remove the complexity inherent in the process of MEMS design. We worry about solving the most challenging MEMS problems so that you don't have to.

Let's face it, there are times when we all long to wrap up our work so that we can spend more time with our loved ones. IntelliSuite was designed to make sure that new features that we add are intuitive and easy to learn so that you don't pore hours over manual, allowing you to be more creative in your designs.

At IntelliSense we know that Simplicity matters. Precision matters. And your creativity matters most.


General features

  • Rich Windows compliant user experience
  • UI taylored for ease of learning and use
  • Rich visual graphics
  • 3d device representation
  • Mask creation
  • Process flow and process modeling
  • Full device analysis and behavior extraction
  • Thin film material database
  • Material properties as function of processing parameters
  • Anisotropic etch simulator
  • Physics simulators for coupled simulations in the following domains: mechanics, electrostatic, electromagnetic, fluidic, piezoresistive,thermal.
  • Import/Export filters to various industry standard data formats

General Analysis Features

  • Linear and non-linear analysis
  • Static, steady state, and transient analysis
  • Fully 3D coupled dynamics analysis
  • Parametric variation of parameters
  • Takes into account fabrication process-induced effects
  • Submodeling, symmetry, and other size reducing techniques
  • Animation and color mapping of results
  • Export and import to/from other engineering CAD tools

Electrostatic, ThermoMechanical, and fully 3D coupled ThermoElectroMechanical

  • Displacement due to voltage and thermal loading
  • Capacitance due to voltage and thermal deformation
  • Pull-in voltage, contact and hysteresis loop calculations
  • Full multi-dielectric capabilities
  • Stress, temperature, potential, charge, and pressure distribution
  • Joule/resistive heating actuation
  • Assembly and latching analysis
  • Post-assembly coupled analysis
  • Natural frequency and mode shapes as a function of loading
  • Heat transfer: radiation, conduction, and convection
Piezoelectric and Piezoresistive
  • Displacement and deformation due to voltage loading
  • Natural frequency and mode shapes as a function of loading
  • Stress distribution

    Electromagnetic-Mechanical
  • Impedance matrix, inductance, and force distribution calculations
  • Low frequency electromagnetic actuation
  • High and low frequencies EM simulation of packaging delay and cross-talk
  • High and low frequencies EM simulation of micro-antennas and micro-motors
  • High frequency electromagnetic simulation for RF devices S-parameter extraction

    Fluidic analysis

    • Electro-osmotic flow
    • Porous media flow
    • Squeezed film liquid and gas damping
    • Charged particle flow
    • Heat transfer
    • Electrophoresis
    • Channel flow

    3D Fluid-Thermo-Mechanical

    • Transient squeezed-film damping (with thermal/electrical actuation)
    • Microchannel fluid flow, micromixing chambers, and micro heat exchangers
    • 3D Multi-phase flow with moving interfaces
    • 3D Fluid-structure interaction with deformable structures
    • Membrane pumps, flapper valves, etc.Full ink-jet nozzle jet simulations

    Material database

  • Predict mechanical, electrical, thermal, physical, optical, and other material properties as a function of processing parameters
  • Over 70 materials in database
  • User database creation
  • Process optimization and estimation routines
  • Linked to IntelliSuite

Anisotropic etch simulation

  • Simulate <100> or <110> wafer orientation etching
  • Simulate etching under different time, temperature, and concentration parameters
  • Access TMAH and KOH etch-rate databases, or use customized etch-rate data
  • Etch the top, bottom, or both sides of a wafer
  • Implement multiple protective etch stops
  • Perform multiple etchings with different masks on a single wafer
  • Study the effects of misalignments and other process deviations
  • Determine the effects of vertical etching coupled with anisotropic etching
  • Perform 3D geometric visualization and cross-sectioning
  • Take distance measurements on the etched wafer
  • Visualize and export 3D results in DXF and VRML formats

Additional features

  • Residual pre-stressing due to fabrication
  • Multiple dielectric layers
  • Squeezed film liquid and air damping
  • Fully 3D dynamic analysis
  • Electrostatic charge distribution
  • Linear and non-linear models
  • Behavioral model output
  • True contact analysis
  • Multiple dielectric layers
  • Snap-down voltage
  • Switching time
  • Hysteresis
  • Frequency shift vs. voltage bias
  • Electrostatic charge distribution
  • High frequency EM simulation
  • Packaging delay
  • Cross-talk
  • S-Parameter extraction
  • Fully 3D dynamic analysis
  • Linear and non-linear models
  • Device behavioral model output
  • Electrostatic pressure distribution
  • Electrostatic charge distribution
  • Capacitance matrix results
  • Joule Heating
  • Hysteresis
  • AC voltage loading


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