When you think about it, MEMS layout is one of the most cumbersome parts of the design process, involving countless revisions, incompatible data formats and minute details. The challenges of MEMS layout are compounded further by the fact that most tools available are IC layout tools, or less-appropriately, architectural design tools.
Finally, a layout tool for MEMS
IntelliMask is the first layout tool designed specifically for the MEMS community. In developing it, our goal was to revisit the workflow of the layout engineer and create a tool that would be effortless to learn and use.
Our design philosophy for IntelliMask is: “simple things should be simple, complex things should be possible.” That’s why our product provides configurable palettes that you can drag and customize to your needs; clearly illustrated icons; and configurable grids and guides — all of which make device layout easier than ever.
We even went a few steps further… automatically linking masks created in IntelliMask to process steps for creating 3D visualization of your device. What’s more, IntelliMask users can now link the layout with automatic mesh creation and refinement for device-level analysis!
IntelliMask's unified workflow makes it easy to layout, analyze and build your MEMS device faster. (SEM courtesy Lucent)
All of the features, none of the cost
IntelliMask incorporates MEMS-specific design features unavailable in standard electronics and mechanical layout tools. Thanks to IntelliMask’s comprehensive design environment, you can take designs from process definition to mask layout to device analysis.
We have also included several features requested specifically by MEMS designers. Arcs, splines, wires and curves are standard features, rather than afterthoughts patched onto an IC layout tool. Control the grid down to a nanometer or create complex shapes easily with our built-in Boolean operations. You can create scaled, rotated and arrayed instances of a cell — and your changes propagate without a hitch.
Layouts courtesy of Matthew Last, BSAC
Advanced features
IntelliMask is not a lightweight mask editor, but a-best-in-class tool designed with sophisticated features not found elsewhere. Among its advanced features is symmetric difference, which can automatically invert your features from clear field (CF) to dark field (DF) and vice versa. You’ll also have the ability to import a bitmap and then trace it using our tools, while creating complex curves, sinusoids and arcs is as straightforward as clicking and dragging!
IntelliMask fits seamlessly within the IntelliSuite design environment. The unified interface is compatible with different components without the headaches of incompatible data formats and exchange errors. We have made it easy for you to import data from legacy layout tools — import and export DXF or GDSII from right within IntelliMask.
Parametric scripting
IntelliMask is fully scriptable, enabling you to create complex parametric cells and features through scripting. We’ve built in a language-independent scripting engine so that you can script IntelliMask with the language of your choice.
A large library
IntelliMask ships with an extensive parametric library of commonly used MEMS elements, ranging from linear and rotary comb drives to release plates and springs. In addition, we’ve included a large library of test elements, such as bent beams, Guckel rings and Euler beams for measuring the material properties of your thin films.
the design process, involving countless revisions, incompatible data formats and minute details. The challenges of MEMS layout are compounded further by the fact that most tools available are IC layout tools, or less-appropriately, architectural design tools.
