MEMaterial, the most comprehensive thin-filmmaterials knowledge base available today, provides a vital link between the process parameters and the device behavior. Use MEMaterial as an organization wide database or knowledge repository or as a tool to optimize processes in your fab.

Thin film database

As the most comprehensive thin-film materials knowledge database and process optimization tool available today, MEMaterial provides a vital link between process parameters and device behavior. Introduced in 1993, and continuously updated, MEMaterial was the first software product to address the lack of thin film material information. Linking actual fabrication machine settings to thin film material properties marked a major milestone in the development of MEMS. By providing insight into the behavior of materials, MEMaterial helps eliminate the trial and error fabrication runs previously used to analyze material behavior.

MEMaterial allows you to predict mechanical, electrical, thermal, optical and other material properties as a function of processing parameters. MEMaterial is based on measured data, rather than constitutive relationships. It contains an extensive database, which you can expand with your own proprietary data. Providing more than 70 processes, MEMaterial is the most comprehensive database of thin film material properties.

Model with confidence

Accurate material properties are vital to creating accurate device models. You may have the most sophisticated device model, but your efforts will be for naught if your material properties are inaccurate. So, if you are serious about MEMS design, MEMaterial is absolutely essential for your needs.

MEMaterial’s proprietary estimation and optimization routine — which has been extensively tested and proven accurate — computes material properties for any given combination of parameters based on measured process data. This method for determining material properties effectively reduces the inter-machine dependencies often noted for thin film depositions. For example, when MEMaterial determines material properties for plasma-enhanced chemical vapor deposition of Si3N4 with Argon as the carrier gas, the estimation routine demonstrates 90.6% and 95.3% accuracy for stress and refractive index, respectively.

Optimize your processes with ease

Process characterization is a time consuming, but MEMaterial allows you to cut your experimentation time significantly. You can use our patented multi-variate optimization routines to gain insight into how your machine parameters, such as carrier gas partial pressures or RF power, affect thin film properties like Young’s modulus and the refractive index. In addition, you’ll be able to expand the databases you’re your company’s own proprietary information.

The bottom line on MEMaterial? Our process optimization routines allow you to cull through your data and predict material properties accurately and easily. What else can you ask for?