IntelliSuite™ Design Demonstration

Fabrication Simulation:
   Process Database
   Process Table
   Thin-film Material Properties

Mask Layout

Virtual Prototyping

Performance Analysis:
   Loads & Boundary Conditions
   Mesh Refinement
   Analysis
   Results
   System Level Design

Anisotropic Etch Simulation:
   Mask Layout
   Process Simulation
   Results

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Mask Layout

AnisE generates 3D models for anisotropic etching of silicon. Beginning with a mask or mask set, the software will generate an accurate geometry. Here we see the etch stop mask for crossed suspended beams.