IntelliSuite™ Design Demonstration

Fabrication Simulation:
   Process Database
   Process Table
   Thin-film Material Properties

Mask Layout

Virtual Prototyping

Performance Analysis:
   Loads & Boundary Conditions
   Mesh Refinement
   Analysis
   Results
   System Level Design

Anisotropic Etch Simulation:
   Mask Layout
   Process Simulation
   Results

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Process Simulation

AnisE can utilize multiple etch stops as well as a variety of etchant, concentration, and temperature settings during analysis.